美商务部工业和安全局拟将26家中方实体移出UVL
来源：IPtoday 发布日期：2022-12-22 阅读：42次
美国当地时间12月15日，据联邦公报官网讯，美国《联邦公报》计划于当地时间16日发布一份由美国商务部工业和安全局（The Bureau of Industry and Security，BIS）拟定的UVL清单（Unverified list，未经核实清单）。清单中包含的26家中国实体或将从UVL中移除。
IP Today将持续关注美国BIS即将正式发布的UVL。
1. Beijing Naura Magnetoelectric Technology Co., Ltd.;
2. CCIC Southern Electronic Product Testing Co., Ltd.;
3. Center for High Pressure Science and Technology Advanced Research;
4. Changchun National Extreme Precision Optics Co., Ltd.;
5. Chinese Academy of Geological Sciences, Institute of Mineral Resources;
6. Chinese Academy of Science (CAS) Institute of Chemistry;
7. Dongguan Durun Optical Technology Co., Ltd.;
8. Foshan Huaguo Optical Co., Ltd.;
9. Guangdong University of Technology;
10. Guangxi Intai Technology Co., Ltd.;
11. Guangxi Yuchai Machinery Co., Ltd.;
12. Guangzhou Hymson Laser Technology Co., Ltd.;
13. Heshan Deren Electronic Technology Co., Ltd.;
14. Hubei Longchang Optical Co., Ltd.;
15. Hubei Sinophorus Electronic Materials Co., Ltd.;
16. Kunshan Heng Rui Cheng Industrial Technology;
17. Shanghai Fansheng Optoelectronic Science & Technology Co. Ltd.;
18. Shanghai Micro Electronics Equipment (Group) Co., Ltd.;
19. ShanghaiTech University;
20. Southern University of Science and Technology, Department of Mechanical and Energy Engineering;
21. University of Chinese Academy of Sciences, School of Chemical Sciences;
22. University of Shanghai for Science and Technology;
23. Vital Advanced Materials Co., Ltd.;
24. Wuhan Juhere Photonic Tech Co., Ltd.;
25. Wuxi Biologics (Shanghai) Co., Ltd.;
26. Zhongshan Thincloud Optics Co., Ltd.;